More on the perils of triethoxysilane

Another hat tip to a colleague, this time Stephen Ritter, for a new letter published late last week in Organic Process Research & DevelopmentOn the Perils of Unexpected Silane Generation” by AstraZeneca scientist Andrew Wells.

…it should never be assumed that reaction mixtures containing reducible substrates, (EtO)3SiH and Lewis acids, will not generate SiH4, and the use and scale-up of any such process should be undertaken with great caution and with high regard for potential hazards of unexpected generation of SiH4. Safer alternatives to (EtO)3SiH that cannot lead to SiH4 generation should always be considered before the use of (EtO)3SiH. Some examples are tetramethyldisiloxane(14) and polymethylhydrosiloxane.(7, 15)

Yes, The emphasis on never is in the original text.

References:
7. Coumbe, T. et al. Tetrahedron Lett. 1994, 35, 625
14. Petit, C. et al. Organometallics 2009, 28, 6379
15. Lawrence, N. J. et al. J. Chem. Soc., Perkin Trans. 1 1999, 23, 3381

Author: Jyllian Kemsley

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